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Laser annealing of laser assisted molecular beam deposited ZnO thin films with application to metal-semiconductor-metal photodetectors

Meiya LiUniversity at Buffalo Electrical Engineering Department, , 332 Bonner Hall, Buffalo, New York 14260Wayne A. AndersonUniversity at Buffalo Electrical Engineering Department, , 332 Bonner Hall, Buffalo, New York 14260Nehal ChokshiRobert L. DeLeonGary S. Tompa
2006en
ABI

Annotatsiya

We report on the effect of postdeposition laser annealing of undoped zinc oxide (ZnO) thin films grown by laser assisted molecular beam deposition. Hall-effect measurements show that some undoped ZnO films change from n type with mobility values in the range of 200cm2V−1s−1 to p-type material with mobility value of 73cm2V−1s−1, after laser annealing. The photoconductive behavior was clearly seen on the laser-annealed samples, with values of 0.28mΩ−1. The structural and optical properties of the films were improved with laser annealing as shown by scanning electron microscopy, x-ray photoelectron spectroscopy analysis, and photoluminescence measurement. All of the nonlaser and laser annealed samples showed near-band emission at ∼3.3eV. Metal-semiconductor-metal photodetectors were fabricated from the films.

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