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Surface-Potential-Based Drain Current Analytical Model for Triple-Gate Junctionless Nanowire Transistors

Renan TrevisoliUniversity of São Paulo, Sao Paulo, BrazilRodrigo T. DoriaCentro Universitário da FEI, Sao Bernardo do Campo, BrazilMichelly de SouzaCentro Universitário da FEI, Sao Bernardo do Campo, BrazilSamaresh DasIsabelle FerainGLOBALFOUNDRIES Inc., Malta, NY, USAMarcelo Antonio PavanelloCentro Universitário da FEI, Sao Bernardo do Campo, Brazil
2012en
ABI

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This paper proposes a drain current model for triple-gate n-type junctionless nanowire transistors. The model is based on the solution of the Poisson equation. First, the 2-D Poisson equation is used to obtain the effective surface potential for long-channel devices, which is used to calculate the charge density along the channel and the drain current. The solution of the 3-D Laplace equation is added to the 2-D model in order to account for the short-channel effects. The proposed model is validated using 3-D TCAD simulations where the drain current and its derivatives, the potential, and the charge density have been compared, showing a good agreement for all parameters. Experimental data of short-channel devices down to 30 nm at different temperatures have been also used to validate the model.

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