Ranges and profiles of distribution of low-energy ions channeling in metal and semiconductor single crystals

In the present work peculiarities of trajectories and energy losses, ranges and profiles of distribution of low-energy different-mass ions channeling in thin single crystals of metals and semiconductors have been thoroughly studied by computer simulation in binary collision approximation. The character of oscillations of channeled-ion trajectories depending on their energies, aiming points from the axis of a channel, kind of interaction potential, crystal lattice type and temperature has been determined. It has been found that, in the case of light ions even at low energy, the main contribution to energy loss is made by inelastic energy losses, whereas for heavy ions, already at E < 10 keV, elastic energy losses exceed inelastic ones. Profiles of the distribution of channeled ions have been calculated depending on crystal lattice type, kind of ions and their energy. Keywords: ChannelingElastic And Inelastic Energy LossesRanges Of Low-energy IonsProfiles Of Distributions

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