Atomic scale structure of sputtered metal multilayers
Xiaowang ZhouDepartment of Materials Science and Engineering, University of Virginia, Charlottesville, VA 22903, USAH.N.G. WadleyDepartment of Materials Science and Engineering, University of Virginia, Charlottesville, VA 22903, USAR. A. JohnsonDepartment of Materials Science and Engineering, University of Virginia, Charlottesville, VA 22903, USADavid J. LarsonRecording Head Operations, Seagate Technology, Minneapolis, MN 55435, USAN. TabatRecording Head Operations, Seagate Technology, Minneapolis, MN 55435, USAA. CerezoDepartment of Materials, University of Oxford, Oxford OX1 3PH, UKA. K. Petford‐LongDepartment of Materials, University of Oxford, Oxford OX1 3PH, UKG.D.W. SmithDepartment of Materials, University of Oxford, Oxford OX1 3PH, UKP. H. CliftonSeagate Technology, Research and Development, Londonderry BT48 0BF, UKR. L. MartensDepartment of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706, USAThomas F. KellyDepartment of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706, USA
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