Multiple processes during the sputtering of materials by ion bombardment
Б. Л. ОксенгендлерInstitute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, UzbekistanС. Е. МаксимовInstitute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, UzbekistanN. N. TuraevaInstitute of Chemistry and Physics of Polymers, Uzbek Academy of Sciences, Tashkent, 100128, UzbekistanN.Yu. TuraevInstitute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, Uzbekistan
ABI
Annotatsiya
A new method of statistical analysis dedicated to filling the gap between dynamic and thermodynamic theories of secondary-particle emission under ion bombardment is proposed. Expressions for the average number of emitted atomic particles and electrons are obtained, and the relationships between their yields are established.
Hali tarjima qilinmagan