Nearly Perfect Transmissive Subtractive Coloration through the Spectral Amplification of Mie Scattering and Lattice Resonance

Silicon has been utilized in metasurfaces to produce structural color filters due to its compatibility with mature and cost-effective methods for complementary metal oxide semiconductor devices. In this work, we propose and demonstrate efficiency- and scattering-enhanced structural color filters using all-dielectric metasurfaces made up of engineered hydrogenated amorphous silicon (a-Si:H) nanoblocks. Wavelength-dependent filtering is achieved by Mie scattering as each structure individually supports the electric dipole (ED) and magnetic dipole (MD) resonances. The ED and MD resonances are identified by observing the field profiles of the resonance calculated by finite element method (FEM) simulations. To enhance the efficiency and scattering response of the all-dielectric metasurfaces, the proposed structural color filters are designed with consideration of the lattice resonances and scattering directivity. The spectral positions of the transmission dips and peaks are rigorously analyzed in accordance with the Mie theory and multipole expansion. The transmission spectra exhibit 100% transmission where Kerker's first condition is satisfied, while the lattice resonances amplify the ED and MD scattering responses throughout the entire visible regime. Various colors are generated by varying the resonance peak, which is controlled by varying the geometric parameters of a-Si:H nanoblocks. The proposed structural color printing devices are expected to have applications in dynamic color displays, imaging devices, and photorealistic color printing.

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