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Ish: Study of the Distribution Profile for Nickel Implanted in Silicon and the Effect of Annealing on the Structure
Dopant microassociation mechanisms in Si〈Mn〉 and Si〈Ni〉
С. З. Зайнабидинов, K. N. Musaev, N. A. Turgunov +1
Maqola20126 iqtibosABI