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Ish: Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon

1. Technology of production and photoelectric characteristics of AlB₁₀ heterojunctions based on silicon

   Numonjon Sultanov, Zokirjon Mirzajonov, Fakhriddin T. Yusupov

   MaqolaSemiconductor materials and interfacesE3S Web of Conferences20236 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.378265

2. RETRACTED: Advancements in Zinc Oxide (ZnO) thin films for photonic and optoelectronic applications: A focus on doping and annealing processes

   Zokirjon Mirzajonov, Khusanboy Manopovich Sulaymonov, Tokhir Rakhmonov +3

   MaqolaZnO doping and propertiesE3S Web of Conferences20245 iqtibos

   ABIABI:AkademIndex/openalex/2024.article.001516