Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge
Jicheng ZhouSchool of Energy Science and Engineering, Central South University, Changsha, 410083, ChinaJia LiaoSchool of Energy Science and Engineering, Central South University, Changsha, 410083, ChinaJing HuangSchool of Energy Science and Engineering, Central South University, Changsha, 410083, ChinaChen TechaoHunan Red Solar Photoelectricity Science and Technology Co., Ltd, Changsha, 410083, ChinaBowen LvSchool of Energy Science and Engineering, Central South University, Changsha, 410083, ChinaYichang PengHunan Red Solar Photoelectricity Science and Technology Co., Ltd, Changsha, 410083, China
2021en
ABI
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