Effect of ion treatment on the properties of In2O3:Sn films

Variations in the properties of Indium-Tin-Oxide (ITO) films grown by reactive HF (high-frequency) magnetron deposition with simultaneous ion treatment are studied depending on the ion-treatment current and substrate temperature. Ion treatment of the growing film during deposition insignificantly changes the relative content of tin and indium, but significantly increases the conductivity. Films obtained at a temperature below 50°C without ion treatment are X-ray amorphous. Ion treatment and an increase in the condensation temperature lead to film crystallization and a shift of the optical absorption edge to short wave-lengths. An increase in the ion-treatment current causes texture formation.

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