Ushbu ishga iqtibos qilgan ishlar

3 ta ish

Ish: Formation of manganese silicide nanowires on Si(111) surfaces by the reactive epitaxy method

1. Formation of Nanosized Films of Chromium Silicides on Silicon Surface

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3. Formation of Nanodimensional SiO2 Films on the Surface of a Free Si/Cu Film System by $${\text{O}}_{2}^{ + }$$ Ion Implantation

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