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Vacancies and vacancy-oxygen complexes in silicon: Positron annihilation with core electrons

J. KuriplachDepartment of Low Temperature Physics, Charles University, V Holešovičkách 2, CZ-180 00 Prague 8, Czech RepublicA.L. MoralesDepartment of Physics, University of Antioquia, A.A. 1226, Medellín, ColombiaC. DauweDepartment of Subatomic and Radiation Physics, University of Ghent, Proeftuinstraat 86, B-9000 Ghent, BelgiumD. SegersDepartment of Subatomic and Radiation Physics, University of Ghent, Proeftuinstraat 86, B-9000 Ghent, BelgiumMojmı́r ŠobInstitute of Physics of Materials, Academy of Sciences of the Czech Republic, Žižkova 22, CZ-616 62 Brno, Czech Republic
1998en
ABI

Annotatsiya

Various point defects in silicon are studied theoretically from the point view of positron annihilation spectroscopy. Properties of a positron trapped at a single vacancy, divacancy, vacancy-oxygen complexes $({\mathrm{VO}}_{n}),$ and divacancy-oxygen complex are investigated. In addition to the positron lifetime and positron binding energy to defects, we also calculate the momentum distribution of annihilation photons (MDAP) for high momenta, which has been recently shown to be a useful quantity for defect identification in semiconductors. The influence of atomic relaxations around defects on positron properties is also examined. Mutual differences among the high momentum parts of the MDAP for various defects studied are mostly considerable, which can be used for the experimental defect determination.

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