Production of a high-density and high-temperature plasma with an intense high-contrast subpicosecond laser
C. Y. ChienCenter for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109-2099 USAJ. C. KiefferInstitut National de la Recherche Scientifique-Energie et Matériaux, 1650 Montée Ste-Julie, Varennes, Québec J3X 1S2, CanadaO. PeyrusseCommissariat à 1′Energie Atomique, Centre d'Étude de Limeil, Villeneuve St-Georges, FranceD. GillesCommissariat à 1′Energie Atomique, Centre d'Étude de Limeil, Villeneuve St-Georges, FranceMohamed ChakerInstitut National de la Recherche Scientifique-Energie et Matériaux, 1650 Montée Ste-Julie, Varennes, Québec J3X 1S2, CanadaJ. S. CoeCenter for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109-2099 USAG. MourouCenter for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109-2099 USAY. BeaudoinInstitut National de la Recherche Scientifique-Energie et Matériaux, 1650 Montée Ste-Julie, Varennes, Québec J3X 1S2, Canada
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We report on the observation of high-electron-density (ne ≈ 15nc where nc is the critical density, 4 × 1021 cm−3 for λ = 0.53 μm) and high-temperature (Te ≈ 400 eV) plasma obtained when an intense high-contrast 400-fs laser pulse interacts with a solid Al target. After the laser intensity is increased from 1016 to 5 × 1017 W/cm2, the kiloelectron-volt x-ray emission is brighter by approximately an order of magnitude and is still produced from very dense plasma (6 × 1022 cm−3).
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