M. Takeda

1 works

Department of Mechanical Engineering, Nagaoka University of Technology, Japan

1. About the mechanism of formation and growth of the higher manganese silicide films on silicon

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +6

   ArticleSemiconductor materials and interfaces20053 citations

   ABIABI:AkademIndex/openalex/2026.other.424565