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AkademBaseOpen API for the ecosystem

Boon Teik Chan

1 works

B-3001 Leuven

  1. Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration

    Ivan Zyulkov, Е. Н. Воронина, Mikhail Krishtab +6

    ArticleSemiconductor materials and devicesMaterials Advances20200 citations
    ABI