Large area, patterned growth of 2D MoS<sub>2</sub> and lateral MoS<sub>2</sub>–WS<sub>2</sub> heterostructures for nano- and opto-electronic applications
Abstract
Abstract The patterned growth of transition metal dichalcogenides (TMDs) and their lateral heterostructures is paramount for the fabrication of application-oriented electronics and optoelectronics devices. However, the large scale patterned growth of TMDs remains challenging. Here, we demonstrate the synthesis of patterned polycrystalline 2D MoS 2 thin films on device ready SiO 2 /Si substrates, eliminating any etching and transfer steps using a combination of plasma enhanced atomic layer deposition (PEALD) and thermal sulfurization. As an inherent advantage of ALD, precise thickness control ranging from a monolayer to few-layered MoS 2 has been achieved. Furthermore, uniform films with exceptional conformality over 3D structures are obtained. Finally, the approach has been leveraged to obtain in-plane lateral heterostructures of 2D MoS 2 and WS 2 thin films over a large area which opens up an avenue for their direct integration in future nano- and opto-electronic device applications.