Works cited by this work

33 works

Work: Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

1. Fluid simulation and experimental validation of plasma radial uniformity in 60 MHz capacitively coupled nitrogen discharges

   Ying-Shuang Liang, Yong-Xin Liu, Yu‐Ru Zhang +1

   Article20152 citations

   ABIABI:AkademIndex/openalex/2026.other.418063

2. Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

   Xiangzhan Jiang, Yong-Xin Liu, Wenqi Lu +3

   Article20112 citations

   ABIABI:AkademIndex/openalex/2026.other.418064

3. Experimental observation of standing wave effect in low-pressure very-high-frequency capacitive discharges

   Yong-Xin Liu, Fei Gao, Jia Liu +1

   Article20142 citations

   ABIABI:AkademIndex/openalex/2026.other.418066

4. Very high frequency capacitively coupled discharges for large area processing

   M. Meyyappan, Michael Colgan

   Article19962 citations

   ABIABI:AkademIndex/openalex/2026.other.418067

5. Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

   Harald Schmidt, L. Sansonnens, A.A. Howling +3

   Article20042 citations

   ABIABI:AkademIndex/openalex/2026.other.418072

6. Enhanced Plasma Uniformity in RF Plasma With Side Multihole

   Hyo‐Chang Lee, Chin‐Wook Chung

   Article20142 citations

   ABIABI:AkademIndex/openalex/2026.other.418073

7. Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

   Emi Kawamura, De‐Qi Wen, M. A. Lieberman +1

   Article20172 citations

   ABIABI:AkademIndex/openalex/2026.other.418075

8. Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

   Shinji Yamada, Masato Omori, Hideki Sakurai +5

   Article20192 citations

   ABIABI:AkademIndex/openalex/2026.other.418079

9. Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge

   Jicheng Zhou, Jia Liao, Jing Huang +3

   Article20212 citations

   ABIABI:AkademIndex/openalex/2026.other.418086

10. Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

    Sen 森 WANG 王, Quanzhi 权治 ZHANG 张, Fangfang 方方 MA 马 +2

    ArticlePlasma Diagnostics and ApplicationsPlasma Science and Technology20241 citations

    ABIABI:AkademIndex/openalex/2024.article.001767

11. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793136

12. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793137

13. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793138

14. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793139

15. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793140

16. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793141

17. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793142

18. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793143

19. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793144

20. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793145

21. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793146

22. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793147

23. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793148

24. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793149

25. Untitled

    Other1 citations

    ABIABI:AkademIndex/openalex/2026.other.793150