Skip to main content
AkademIndex

Products

For developers

AkademBaseOpen API for the ecosystem
← Back to work

Works citing this work

1 works

  1. Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration

    Ivan Zyulkov, Е. Н. Воронина, Mikhail Krishtab +6

    ArticleSemiconductor materials and devicesMaterials Advances20200 citations
    ABI