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Work: Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges
Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode
Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1
ArticlePlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 citationsABI