Works citing this work

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Work: Relationship of electrical resistance of polycrystalline tin films to structural characteristics

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   C. R. Pichard, Yu. F. Komnik, Б. И. Белевцев +1

   ArticleCopper Interconnects and ReliabilityJournal of Materials Science Letters19830 citations

   ABIABI:AkademIndex/openalex/1983.article.000029