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Works citing this work
1 works
High-temperature high-dose implantation of N+ and Al+ ions in 6H-SiC
R.A. Yankov
,
M. Voelskow
,
W. Kreissig
+6
Article
Silicon Carbide Semiconductor Technologies
Technical Physics Letters
1997
0 citations
ABI
ABI:AkademIndex/openalex/1997.article.000097