Works citing this work

2 works

Work: Electrical Resistance Measurements on Hydrogen‐Charged Tantalum and Niobium

1. Effect of impurities on the residual resistance of niobium

   Β. N. Aleksandrov, G. P. Kovtun, V. A. Elenskiǐ

   ArticleMetal and Thin Film MechanicsSoviet Journal of Low Temperature Physics19790 citations

   ABIABI:AkademIndex/openalex/1979.article.000069

2. Influence of the type of impurity on the scattering of conduction electrons in niobium and vanadium at 20.4 °K

   Β. N. Aleksandrov, Н. В. Далакова, М. И. Слободской +1

   ArticleAdvanced Chemical Physics StudiesSoviet Journal of Low Temperature Physics19810 citations

   ABIABI:AkademIndex/openalex/1981.article.000158