Influence of synchrotron radiation on morphological features of a polymethylmetacrilate thin film
Аннотация
The interaction of polymethylmetacrilate (PMMA) hard films with synchrotron radiation (SR) has been studied by atomic force microscopy (AFM). It has been found that the roughness changes from 1.85 to 2.98 nm with an increase in the irradiation time for the selected beam with the energy corresponding to the hard X-ray region λ = 0.2 nm. The roughness decreases from 6.41 to 2.36 nm with an increase in the irradiation time from 1 to 17 min when photons with a lower energy are used. The interaction of radiation with PMMA leads to the appearance of nanohillocks, the average diameter and height of which depend directly proportionally on the spectral composition and SR exposure time. The revealed effects of interaction of synchrotron radiation with PMMA will help to correct the X-ray lithography conditions in electron engineering (PMMA is the basis for X-ray resist) and will allow one to control the roughness degree of the PMMA surface that is the basis for intraocular lenses.