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Collisionless magnetized rf sheath resonance heating in dual-frequency capacitively coupled plasmas

Ming-Yue HanSchool of Physics, Dalian University of Technology 1 , Dalian 116024,Fang‐Fang MaSchool of Physics, Dalian University of Technology 1 , Dalian 116024,H. J. WenSchool of Physics, Dalian University of Technology 1 , Dalian 116024,Yu-Meng CuiDUT-BSU Joint Institute, Dalian University of Technology 2 , Dalian 116024,Nosir MatyakubovDepartment of Physics, Urgench State University 3 , Urgench 220100,Umedjon KhalilovIon-Plasma and Laser Technologies (IPLT), Academy of Sciences of Uzbekistan, 5 Durmon Yuli 33, Tashkent 100125,Quan‐Zhi ZhangDUT-BSU Joint Institute, Dalian University of Technology 2 , Dalian 116024,
ABI

Аннотация

This study employs Particle-In-Cell/Monte Carlo Collision simulations to examine the magnetized radio frequency sheath resonance heating mechanism in a voltage-driven discharge using a dual-frequency source. The effects of low-frequency (LF) voltage, high-frequency (HF) voltage, and pressure on the resonance heating mechanism are well examined. Increasing the LF voltage and the HF voltage produces opposite effects on the resonance effect. In comparison to the traditional dual-frequency discharges, the application of a magnetic field under resonant conditions shifts the maximum heating rate from the low-frequency sheath collapse phase to the maximum phase of LF sheath expansion. This shift indicates significant changes in the heating mode and electron dynamical behavior induced by the resonance effect.

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