Multiple processes during the sputtering of materials by ion bombardment
Б. Л. ОксенгендлерInstitute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, UzbekistanС. Е. МаксимовInstitute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, UzbekistanN. N. TuraevaInstitute of Chemistry and Physics of Polymers, Uzbek Academy of Sciences, Tashkent, 100128, UzbekistanN.Yu. TuraevInstitute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, Uzbekistan
ABI
Аннотация
A new method of statistical analysis dedicated to filling the gap between dynamic and thermodynamic theories of secondary-particle emission under ion bombardment is proposed. Expressions for the average number of emitted atomic particles and electrons are obtained, and the relationships between their yields are established.
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