Работы, цитирующие эту работу

Работ: 2

Работа: Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

1. Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

   Sen 森 WANG 王, Quanzhi 权治 ZHANG 张, Fangfang 方方 MA 马 +2

   СтатьяPlasma Diagnostics and ApplicationsPlasma Science and Technology2024Цитирований: 1

   ABIABI:AkademIndex/openalex/2024.article.001767

2. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

   Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

   СтатьяPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena2025Цитирований: 0

   ABIABI:AkademIndex/openalex/2025.article.009577