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Hall mobility of polycrystalline silicon

H. Paul MaruskaExxonMobil (United States)Amal K. GhoshExxon Research and Engineering Co., Linden, New Jersey 07036Albert RoseExxon Research and Engineering Co., Linden, New Jersey 07036Tom FengExxon Research and Engineering Co., Linden, New Jersey 07036
1980en
ABI

Аннотация

Hall mobility of polycrystalline silicon was measured in the dark and under illuminated conditions. Grain boundary potential barriers present in the dark can be eliminated with light. When the barriers are removed, the mobility between 200 and 400 K is found to vary as T−2, which is the dependence observed in single crystals for the same order of magnitude of doping. The free-carrier concentration of 5×1015 cm−3 was not affected by illumination, and the room temperature mobility in 1-mm grain size material after barrier elimination with light was 900 cm2/V sec. A phenomological theory of Hall mobility in polycrystallllne silicon which explains these observations is presented.

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