<title>Chemical vapor deposition of diamond films on nonuniformly heated substrates</title>

To observe the effect of temperature on the deposition processes polycrystalline diamond films were gown on the nonuniformly heated substrates by hot filament chemical vapor deposition technique using methanol and hydrogen gas mixture in quartz reactor. To provide nonuniformity of substrate temperature molybdenum pedestal was placed on the quartz tube, which removed heat from the substrate. p-type and silicon n-type and 6H silicon wafers were used as substrate. Polycrystalline diamond films with grain size of 1-3 micron were deposited.An applicability of diamond pyramid hardness tester for the preliminary examination of the diamond films is shown. Scanning electron micrographs and Raman spectrum of some films are presented.

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