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Quan‐Zhi Zhang

7 та иш

Dalian University of Technology, Dalian, 116024, China

  1. Computer Simulations to Study the Mechanisms of Cold Plasma-Induced Degradation of Amoxicillin

    Otamurot Rajabov, Quan‐Zhi Zhang, Nosir Matyakubov +3

    МақолаAntibiotics Pharmacokinetics and EfficacyPlasma Chemistry and Plasma Processing20251 иқтибос
    ABI

  2. Role of Direct Plasma Irradiation, Plasma-Activated Liquid, and Plasma-Treated Soil in Plasma Agriculture

    Pankaj Attri, Takamasa Okumura, Nozomi Takeuchi +5

    МақолаRadiation Effects and DosimetryPlasma Medicine20230 иқтибос
    ABI

  3. Impurity sputtering model for ICRF edge plasma–surface interactions

    Quan‐Zhi Zhang, Z. W. Liu, Fang‐Fang Ma +2

    МақолаParticle accelerators and beam dynamicsChinese Physics B20240 иқтибос
    ABI

  4. Collisionless magnetized rf sheath resonance heating in dual-frequency capacitively coupled plasmas

    Ming-Yue Han, Fang‐Fang Ma, H. J. Wen +4

    МақолаPlasma Diagnostics and ApplicationsJournal of Applied Physics20250 иқтибос
    ABI

  5. Plasma-assisted catalysis for graphene pre-nucleation: the role of high-index nickel nanocrystal surfaces

    Tursunpulat Juraboev, Feruz Khaydarov, Quan‐Zhi Zhang +2

    МақолаGraphene research and applicationsChemical Physics Letters20250 иқтибос
    ABI

  6. Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

    Yu-Meng Cui, Fang‐Fang Ma, Ziheng Liu +3

    МақолаPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology A Vacuum Surfaces and Films20250 иқтибос
    ABI

  7. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

    Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

    МақолаPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 иқтибос
    ABI