Ушбу иш иқтибос қилган ишлар

7 та иш

Иш: Effect of anodic etching of heavily doped silicon on the location of the plasma minimum

1. Determination of Optical Constants and Carrier Effective Mass of Semiconductors

   W. G. Spitzer, Heng Fan

   Мақола19572 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.404966

2. Resistivity of Bulk Silicon and of Diffused Layers in Silicon

   J.C. Irvin

   Мақола19622 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.518120

3. Chemically etched porous silicon as an anti-reflection coating for high efficiency solar cells

   L. Schirone, Giovanni Sotgiu, F. Califano

   Мақола19972 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.666799

4. Сарлавҳасиз

   Бошқа1 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.666798

5. Сарлавҳасиз

   Бошқа1 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.666800

6. Сарлавҳасиз

   Бошқа1 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.666801

7. Сарлавҳасиз

   Бошқа1 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.666802