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Иш: Optimum ion implantation and annealing conditions for stimulating secondary negative ion emission

1. Sputtering by Particle Bombardment III

   R. Behrisch, K. Wittmaack, Wittmaack, Klaus +1

   Китоб199118 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.200782