← Ишга қайтиш
Ушбу иш иқтибос қилган ишлар
19 та иш
Иш: Study of doping uniformity of a 200 kV ion implanter by RBS and sheet resistance measurements
Simulated annealing analysis of Rutherford backscattering data
N.P. Barradas, C. Jeynes, R.P. Webb
Мақола19975 иқтибосABIFundamentals of surface and thin film analysis
L. C. Feldman, James W. Mayer, F. Adams
Мақола19892 иқтибосABI