Study of doping uniformity of a 200 kV ion implanter by RBS and sheet resistance measurements
Hui LiKey Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, ChinaZe-Song WangKey Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, ChinaShengjun ZhangKey Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, ChinaVasiliy PelenovichInstitute of Ion-Plasma and Laser Technologies, Academy of Sciences of Uzbekistan, Tashkent, 700135, UzbekistanFeng RenKey Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, ChinaDejun FuKey Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, ChinaChuan-Sheng LiuKey Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, ChinaZhiwei AiKey Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China
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