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Иш: Collisionless magnetized rf sheath resonance heating in dual-frequency capacitively coupled plasmas
Electrostatic modelling of dual frequency rf plasma discharges
P C Boyle, A. R. Ellingboe, M. M. Turner
Мақола20042 иқтибосABIDual excitation reactive ion etcher for low energy plasma processing
H. Gotô, Hans-Dirk Löwe, Tadahiro Ohmi
Мақола19922 иқтибосABI