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Optical Performance and Crystal Structure of TiO2 Thin Film on Glass Substrate Grown by Atomic Layer Deposition

T. K. TurdalievArifov Institute of Ion-Plasma and Laser Technologies of Uzbekistan Academy of Sciences, Tashkent, Uzbekistan
ABI

Аннотация

This study investigates the formation of the optical properties and crystal structure of TiO2 thin films, with a thickness of approximately 1.5 micrometers, grown on a glass substrate using the atomic layer deposition method with titanium tetraisopropoxide and water as precursors. X-ray diffraction and Raman spectroscopy analyses confirmed that the TiO2 films crystallize in the anatase polymorphic phase. The films exhibit a nanocrystalline structure with an average crystallite size of approximately 28 nanometers, as established by X-ray diffraction measurements. The X-ray diffraction pattern revealed distinct peaks at 2θ angles of 25.3°, 38.6°, 48.0°, 55.0°, and 70.4°, corresponding to the (101), (112), (020), (121), and (220) crystallographic planes, while the Raman spectra exhibited pronounced peaks at frequencies of 143, 194, 392, 514, and 637 cm⁻¹, all characteristic of the anatase phase of TiO2. The Tauc method applied to the absorption spectra of the thin film showed that it has a direct bandgap of 3.2 eV and an indirect bandgap of 2.3 eV.

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