Ушбу иш иқтибос қилган ишлар

33 та иш

Иш: Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

1. Fluid simulation and experimental validation of plasma radial uniformity in 60 MHz capacitively coupled nitrogen discharges

   Ying-Shuang Liang, Yong-Xin Liu, Yu‐Ru Zhang +1

   Мақола20152 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418063

2. Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

   Xiangzhan Jiang, Yong-Xin Liu, Wenqi Lu +3

   Мақола20112 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418064

3. Experimental observation of standing wave effect in low-pressure very-high-frequency capacitive discharges

   Yong-Xin Liu, Fei Gao, Jia Liu +1

   Мақола20142 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418066

4. Very high frequency capacitively coupled discharges for large area processing

   M. Meyyappan, Michael Colgan

   Мақола19962 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418067

5. Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

   Harald Schmidt, L. Sansonnens, A.A. Howling +3

   Мақола20042 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418072

6. Enhanced Plasma Uniformity in RF Plasma With Side Multihole

   Hyo‐Chang Lee, Chin‐Wook Chung

   Мақола20142 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418073

7. Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

   Emi Kawamura, De‐Qi Wen, M. A. Lieberman +1

   Мақола20172 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418075

8. Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

   Shinji Yamada, Masato Omori, Hideki Sakurai +5

   Мақола20192 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418079

9. Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge

   Jicheng Zhou, Jia Liao, Jing Huang +3

   Мақола20212 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.418086

10. Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

    Sen 森 WANG 王, Quanzhi 权治 ZHANG 张, Fangfang 方方 MA 马 +2

    МақолаPlasma Diagnostics and ApplicationsPlasma Science and Technology20241 иқтибос

    ABIABI:AkademIndex/openalex/2024.article.001767

11. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793136

12. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793137

13. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793138

14. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793139

15. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793140

16. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793141

17. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793142

18. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793143

19. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793144

20. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793145

21. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793146

22. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793147

23. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793148

24. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793149

25. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.793150