Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

1. Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

   Sen 森 WANG 王, Quanzhi 权治 ZHANG 张, Fangfang 方方 MA 马 +2

   МақолаPlasma Diagnostics and ApplicationsPlasma Science and Technology20241 иқтибос

   ABIABI:AkademIndex/openalex/2024.article.001767

2. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

   Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

   МақолаPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 иқтибос

   ABIABI:AkademIndex/openalex/2025.article.009577