Ушбу ишга иқтибос қилган ишлар

3 та иш

Иш: Atomic and cluster ion emission from silicon in secondary-ion mass spectrometry

1. Fragmentation of sputtered Si n O+ m clusters: Release kinetic and dissociation energies

   Н. Х. Джемилев, С. Ф. Коваленко, L.F. Lifanova +2

   МақолаIon-surface interactions and analysisBulletin of the Russian Academy of Sciences Physics200811 иқтибос

   ABIABI:AkademIndex/openalex/2008.article.000100

2. Mechanism for the formation of molecular clusters under ion sputtering

   Н. Х. Джемилев

   МақолаIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20127 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.366498

3. On the unimolecular decay and mechanism of formation of Si+ n cluster ions

   Н. Х. Джемилев, С. Ф. Коваленко, С. Е. Максимов +2

   МақолаIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20152 иқтибос

   ABIABI:AkademIndex/openalex/2015.article.000330