Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Detailed analysis of thin phosphorus-diffused layers in p-type silicon

1. Diffusion of Phosphorus and Gallium from a Deposited Layer of Gallium Phosphide into Silicon

   Н. Ф. Зикриллаев, S. Koveshnikov, Kh. S. Turekeev +2

   МақолаSilicon and Solar Cell TechnologiesPhysics of the Solid State20220 иқтибос

   ABIABI:AkademIndex/openalex/2022.article.002687

2. Diffusion of Phosphorus and Gallium from a Deposited Layer of Gallium Phosphide into Silicon

   Н. Ф. Зикриллаев, S. Koveshnikov, Kh.S. Turekeev Kh. S. +2

   МақолаSemiconductor materials and interfacesФизика твердого тела20220 иқтибос

   ABIABI:AkademIndex/openalex/2022.article.010395