Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Secondary ion yield variations due to cesium implantation in silicon

1. Temperature Dependences of the Sputtering of Negative Silicon Cluster Ions

   Б.Г. Атабаев, R. Dzabbarganov, F. R. Yuzikaeva +3

   МақолаIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20230 иқтибос

   ABIABI:AkademIndex/openalex/2023.article.004220

2. Emission of Negative Copper Cluster Ions as a Function of Temperature and Bombarding Ion Energy

   R. Djabbarganov, B. G. Atabaev, A. S. Khalmatov

   МақолаIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20250 иқтибос

   ABIABI:AkademIndex/openalex/2025.article.019144