Mao Lin

2 ta ish

University of Illinois Urbana-Champaign

1. Reactive ion etching of GaN using BCl3

   Mao Lin, Zhaoyan Fan, Zhongqi Ma +2

   Maqola19942 iqtibos

   ABIABI:AkademIndex/2026.other.512963

2. Large-band-gap SiC, III-V nitride, and II-VI ZnSe-based semiconductor device technologies

   H. Morkoç̌, S. Strite, Guangjun Gao +3

   Maqola19942 iqtibos

   ABIABI:AkademIndex/2026.other.668922