R. T. Tung

2 ta ish

Tokyo Institute of Technology

1. Oxide mediated epitaxy of CoSi2 on silicon

   R. T. Tung

   Maqola19962 iqtibos

   ABIABI:AkademIndex/2026.other.510518

2. A Novel Technique for Ultrathin CoSi₂ Layers: Oxide Mediated Epitaxy

   R. T. Tung

   Maqola19972 iqtibos

   ABIABI:AkademIndex/2026.other.510520