Jaan Aarik

2 ta ish

University of Tartu

1. Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

   Jaan Aarik, Aleks Aidla, Teet Uustare +2

   Maqola20004 iqtibos

   ABIABI:AkademIndex/2026.other.424171

2. Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase

   Mikael Schuisky, Anders Hårsta, Aleks Aidla +3

   Maqola20002 iqtibos

   ABIABI:AkademIndex/2026.other.433659