Hajime Kitagawa

1 ta ish

Fukuoka Institute of Technology

1. In-Diffusion and Annealing Processes of Substitutional Nickel Atoms in Dislocation-Free Silicon

   Shuji Tanaka, Tetsuo Ikari, Hajime Kitagawa

   Maqola20017 iqtibos

   ABIABI:AkademIndex/2026.other.296297