F.A. Mirzaeva

1 ta ish

Islom Karimov nomidagi Toshkent davlat texnika universiteti

1. Thin silicide films: producing and properties

   А.С. Рысбаев, S. S. Nasriddinov, Yu. Yu. Yuldashev +4

   MaqolaSemiconductor materials and interfaces20042 iqtibos

   ABIABI:AkademIndex/2026.other.493202