Hiroki Hibino

1 ta ish

NTT Basic Research Laboratories

1. Void growth during thermal decomposition of silicon oxide layers studied by low-energy electron microscopy

   Hiroki Hibino, Masashi Uematsu, Yoshio Watanabe

   Maqola20062 iqtibos

   ABIABI:AkademIndex/2026.other.736263