P. Kuppusami

1 ta ish

1. Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

   A. Albert Irudayaraj, P. Kuppusami, R. Thirumurugesan +3

   Maqola20072 iqtibos

   ABIABI:AkademIndex/2026.other.160804