Alberto Palmero

4 ta ish

Institute of Materials Science of Seville

1. On the ion and neutral atom bombardment of the growth surface in magnetron plasma sputter deposition

   E.D. van Hattum, Alberto Palmero, W.M. Arnoldbik +2

   Maqola20073 iqtibos

   ABIABI:AkademIndex/2026.other.172146

2. Perspectives on oblique angle deposition of thin films: From fundamentals to devices

   Ángel Barranco, Ana Borrás, Agustı́n R. González-Elipe +1

   Maqola20153 iqtibos

   ABIABI:AkademIndex/2026.other.456068

3. One-dimensional analysis of the rate of plasma-assisted sputter deposition

   Alberto Palmero, H. Rudolph, F.H.P.M. Habraken

   Maqola20072 iqtibos

   ABIABI:AkademIndex/2026.other.172134

4. Gas heating in plasma-assisted sputter deposition

   Alberto Palmero, H. Rudolph, F.H.P.M. Habraken

   Maqola20052 iqtibos

   ABIABI:AkademIndex/2026.other.352517