B.A. Kadyrov

1 ta ish

Islom Karimov nomidagi Toshkent davlat texnika universiteti

1. Application of ion implantation for obtaining the nanofilms of metal silicides

   Б. Е. Умирзаков, Д. А. Ташмухамедова, B.A. Kadyrov

   MaqolaSemiconductor materials and interfacesUzbekiston Fizika Zhurnali20080 iqtibos

   ABIABI:AkademIndex/2008.article.000493