Víctor Adedeji

2 ta ish

Auburn University

1. Oxide film assisted dopant diffusion in silicon carbide

   Chin‐Che Tin, Suwan Mendis, Kerlit Chew +6

   MaqolaSilicon and Solar Cell TechnologiesThin Solid Films20105 iqtibos

   ABIABI:AkademIndex/2026.other.390738

2. Nonequilibrium Diffusion of Boron in SiC at Low Temperatures

   Iikham G. Atabaev, Tojiddin M. Saliev, É. N. Bakhranov +6

   MaqolaOAOchiq kirishSilicon Carbide Semiconductor TechnologiesMaterials Sciences and Applications20105 iqtibos

   ABIABI:AkademIndex/2026.other.390741